Molecular Imprints Inc., founded in 2001 by Cockrell School of Engineering professors S.V. Sreenivasan and Grant Willson, recently announced that Canon Inc. will purchase its semiconductor imprint lithography equipment business. Molecular Imprints’ innovative technology is the result of extensive research conducted at the Cockrell School and is a successful example of how UT Austin ingenuity is shaping the future of the nanomanufacturing industry.
Gigaphoton Inc., a major lithography light source manufacturer, announced today that the company’s flagship high-power ArF Immersion Laser (GT64A) will be used by the Global 450 Consortium (G450C), headquartered at SUNY’s College of Nanoscale Science and Engineering (CNSE) in Albany, New York, as the light source for its first 450mm ArF Immersion lithography scanners.
Gigaphoton Inc., a major lithography light source manufacturer, announced today that it has achieved 43W output at 100kHz from its second prototype laser-produced plasma (LPP) light source for EUV lithography scanners.
Molecular Imprints Inc. (MII), the market and technology leader for nanopatterning systems and solutions, today announced it has signed an agreement to sell its semiconductor imprint lithography equipment business to Canon Inc. of Tokyo, Japan. Canon currently manufactures and markets KrF excimer and i-line illumination optical lithography platforms.
Rudolph Technologies, Inc. announced today it has received two orders for its lithography systems, totaling more than $11 million. Purchase orders include a repeat order for the JetStep™ Lithography System for advanced packaging (AP) applications and a repeat order for a PanelPrinter™ 9200 System for flat panel display (FPD) lithography.
Research and Markets has announced the addition of the "Lithography, Deposition, and Etch Market Analysis for Flip Chip/WLP Manufacturing" report to their offering.
Photronics, Inc. , a worldwide leader in supplying innovative imaging technology solutions for the global electronics industry, today announced an agreement with Dai Nippon Printing Co., Ltd. (DNP) (7912:Tokyo Stock Exchange) to merge Photronics Semiconductor Mask Corporation (PSMC), a majority owned subsidiary of Photronics, with DNP Photomask Technology Taiwan Co., Ltd. (DPTT), a wholly owned subsidiary of DNP, to form a joint venture focused on serving semiconductor manufacturers in Taiwan.
Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful.
Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optic technology for EUV lithography (EUVL), has unveiled its new line of EUVL solutions to support high volume EUV Lithography in conjunction with successful appearances at the 2013 International Symposium on Extreme Ultraviolet Lithography in Toyama, Japan.
Graphene emerges as a versatile new surface to assemble model cell membranes mimicking those in the human body, with potential for applications in sensors for understanding biological processes, disease detection and drug screening.
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