SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, and SEMATECH, a global consortium of semiconductor manufacturers, announced today that SUSS MicroTec’s photomask equipment division has partnered with SEMATECH to investigate and develop extreme ultraviolet lithography (EUVL) substrate and blank cleaning technologies that will accelerate process availability for extreme ultraviolet pilot line manufacturing.
D2S®, a supplier of computational design platforms, today announced that it has extended its partnership with NuFlare Technology, a world leader in electron beam (eBeam) mask writing systems, to accelerate the deployment of eBeam technologies that reduce write times and improve the accuracy of advanced photomasks for future design nodes leveraging general purpose graphic processing unit (GPGPU) acceleration.
The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of the second annual eBeam Initiative survey. 28 member companies from across the photomask supply chain participated in the survey.
BioForce Nanosciences, Inc. (“BioForce”) announced the addition of Acugenex Limited (“Acugenex”) to BioForce’s international network of partners and distributors. The partnership will help BioForce increase its market share, support capabilities and manufacturing to Europe, the Middle East, Africa and parts of Asia.
At the 15th China International Optoelectronic Exposition (CIOE 2013), Bruker introduced the new LumiMap™ Electroluminescence System for uncompromised HB-LED epi wafer process metrology.
LumiMap joins a suite of...
An international group of researchers from the University of Minnesota, Argonne National Laboratory and Seoul National University have discovered a groundbreaking technique in manufacturing nanostructures that has the potential to make electrical and optical devices smaller and better than ever before. A surprising low-tech tool of Scotch Magic tape ended up being one of the keys to the discovery.
The new electron beam writer housed in the Nano3 cleanroom facility at the Qualcomm Institute is important for electrical engineering professor Shadi Dayeh’s two major areas of research. He is developing next-generation, nanoscale transistors for integrated electronics; and he is developing neural probes that have the capacity to extract electrical signals from individual brain cells and transmit the information to a prosthetic device or computer.
The world’s most famous painting has now been created on the world’s smallest canvas. Researchers at the Georgia Institute of Technology have “painted” the Mona Lisa on a substrate surface approximately 30 microns in width – or one-third the width of a human hair.
In order to thwart forgeries, EPFL researchers propose a new miniaturized authentication system. By combining both, moiré patterns and microlithography techniques, it can be easily recognized by the naked eye and impossible to reproduce through currently existing printer or scanner technology.
EV Group (EVG), a leading equipment supplier for photovoltaic (PV) cell and module manufacturing, including anti-reflective and anti-soiling coating, nanoimprint lithography, thin-wafer processing, wafer bonding and photolithography equipment, today announced it is showcasing its latest innovations for improving performance and reducing costs of next-generation PV cells and modules at Intersolar North America this week at the Moscone Convention Center in San Francisco.
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