Nanolithography News

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Microscopic Single Atom Transistors for Futuristic Quantum Computers

Researchers of the University of New South Wales (UNSW) have developed a single atom transistor comprising only one atom in a silicon crystal.

21 Feb 2012

TEL Joins CEA-Leti’s Collaborative Industrial Programs on Lithography

Tokyo Electron Limited (TEL), a global provider of semiconductor and FPD production equipment, has joined two of CEA-Leti’s collaborative and open industrial lithography programs, IMAGINE and IDEAL.

16 Feb 2012

Gigaphoton One Step Closer to Deliver its EUV Lithography Solution

Gigaphoton declared that its high-volume manufacturing laser-produced plasma (LPP) light source, slated for shipping in 2012, has produced an extreme ultraviolet (EUV) power of 7 W.

15 Feb 2012

Imec Implements 300 mm Fab-Compatible DSA Process Line

At the SPIE Advanced Lithography conference to be conducted in San Jose, California, Imec will announce the successful deployment of first-of-its-kind 300 mm fab-compatible directed self-assembly (DSA) process line in its 300 mm cleanroom fab.

From IMEC 14 Feb 2012

CEA-Leti Reports Latest Achievements on MAPPER’s Lithography Solution

CEA-Leti has reported noteworthy advancements of the massively parallel direct write technology designed by MAPPER Lithography.

From CEA-Leti 14 Feb 2012

Development of E-Beam Proximity Effect Correction Methods for Mask Writing and Maskless Lithography

Fraunhofer Center Nanoelectronic Technologies (CNT) has joined Dresden and ASELTA Nanographics to develop e-beam proximity effect correction methods for maskless lithography (ML2) and mask writing applications.

13 Feb 2012

Development of Novel Tip Aids in Nanolithography and Nanomanufacturing Applications

A team of researchers at IBM Research – Zurich, the University of Wisconsin-Madison and the University of Pennsylvania has developed a nano-sized silicon carbide tip that has a wear resistance of 10,000 folds higher than that of the earlier designs, a major breakthrough in nanomanufacturing for applications such as biosensors for environment and healthcare monitoring.

From IBM Zurich Research Laboratory 10 Feb 2012

WNLO to get Electron Beam Lithography Capabilities Thanks to Vistec

Vistec Lithography, B.V. is pleased to announce today that Wuhan National Laboratory for Optoelectronics (WNLO) at the Huazhong University of Science and Technology (HUST) in Wuhan, P.R. of China signed off its electron-beam lithography system Vistec EBPG5000pES.

16 Jan 2012

USHIO Expands UX4 Series of Full-Field Projection Lithography Tools

USHIO has expanded its modular full-field projection lithography tool line called the UX4 Series with the launch of three new models, the UX4-ECO FFPL 150, the UX4-MEMS FFPL 200 and the UX4-3Di FFPL 300, for producing power devices, MEMS devices and three-dimensional LSI devices, respectively.

7 Dec 2011

Nanolithography News

Microscopic Single Atom Transistors for Futuristic Quantum Computers

TEL Joins CEA-Leti’s Collaborative Industrial Programs on Lithography

Gigaphoton One Step Closer to Deliver its EUV Lithography Solution

Imec Implements 300 mm Fab-Compatible DSA Process Line

CEA-Leti Reports Latest Achievements on MAPPER’s Lithography Solution

Development of E-Beam Proximity Effect Correction Methods for Mask Writing and Maskless Lithography

Development of Novel Tip Aids in Nanolithography and Nanomanufacturing Applications

WNLO to get Electron Beam Lithography Capabilities Thanks to Vistec

USHIO Expands UX4 Series of Full-Field Projection Lithography Tools

Gigaphoton Supplies 1,000th Excimer Laser for Semiconductor Photolithography

Printable 3D Metalenses Bring Full-Colour VR Displays Closer to Scalable Nanomanufacturing

Chitosan Nanoparticles Could Make Vaccines More Stable, Mucosal, and Needle-Free

Cellulose Nanofibril Binder Helps Build Cleaner, Higher-Capacity Lithium Batteries

Shape-Shifting Nanorobots Assemble Into Chains, Ribbons, and Swarms on Demand

Light-Driven Bismuth Nanomaterials Show Promise Against Tumors and Bacteria

How First Graphene is Turning Potential into a Reality

Smarter, Faster Stability Testing: Improving Detergent and Cosmetic Formulation Development

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