Nanoelectronics News

RSS

Cadence Advanced-Node Design and SiP Deliver Fast Time to Volume for Users of TSMC Process Technology

Cadence Design Systems today announced that its suite of Cadence® Encounter® Digital Implementation System solutions, including design closure, low-power, DFM, mixed-signal, and signoff technologies, as well as System-In-Package design technology are included in TSMC Reference Flow 10.0.

From TSMC Taiwan Semiconductor Manufacturing Company 23 Jul 2009

Cadence and TSMC Announces Broad Expansion of their Collaboration

Cadence Design Systems, Inc. (NASDAQ: CDNS), the leader in global electronic design innovation, and Taiwan Semiconductor Manufacturing Company (TSMC) today announced a broad expansion of their collaboration to better ena...

From TSMC Taiwan Semiconductor Manufacturing Company 23 Jul 2009

Rudolph Technologies Receives Multiple Orders for Wafer Scanner and NSX Series Inspection Tools

Rudolph Technologies, Inc. (NASDAQ: RTEC), today announced the receipt of multiple orders for its Wafer Scanner (WS) 3840™ and NSX® Series inspection tools from new and repeat customers in China and Taiwan.

From Onto Innovation 23 Jul 2009

Strasbaugh Receives $3.6 Million Order for Multiple nTellect Wafer Grinding Systems

Strasbaugh (OTC Bulletin Board: STRB) announced today that a $3.6 million order for multiple nTellect (Model 7AF) wafer grinding systems has been received. The grinders are scheduled for shipment to the customer prior to...

23 Jul 2009

Toshiba Deploys Magma's Talus IC Implementation Software for 90-, 65- and 40-nm Process Nodes

Magma Design Automation Inc. (Nasdaq:LAVA), a provider of chip design software, today announced that Toshiba Corporation, the world's leading supplier of semiconductors for consumer electronics, has deployed Magma&#3...

23 Jul 2009

Synopsys Announces Galaxy Implementation Platform Supports TSMC's 28-Nanometer Process Technology With Reference Flow 10.0

Synopsys, Inc. (NASDAQ:SNPS) , a world leader in software and IP for semiconductor design, verification and manufacturing, today announced that the Galaxy(TM) Implementation Platform supports TSMC's 28-nanometer (nm)...

From TSMC Taiwan Semiconductor Manufacturing Company 22 Jul 2009

Scientists Found Method of Attaching Molecules to Semiconducting Silicon

Scientists at Rice University and North Carolina State University have found a method of attaching molecules to semiconducting silicon that may help manufacturers reach beyond the current limits of Moore's Law as they make microprocessors both smaller and more powerful.

22 Jul 2009

Nanoelectronics News

Cadence Advanced-Node Design and SiP Deliver Fast Time to Volume for Users of TSMC Process Technology

Cadence and TSMC Announces Broad Expansion of their Collaboration

Rudolph Technologies Receives Multiple Orders for Wafer Scanner and NSX Series Inspection Tools

Strasbaugh Receives $3.6 Million Order for Multiple nTellect Wafer Grinding Systems

Toshiba Deploys Magma's Talus IC Implementation Software for 90-, 65- and 40-nm Process Nodes

Synopsys Announces Galaxy Implementation Platform Supports TSMC's 28-Nanometer Process Technology With Reference Flow 10.0

Scientists Found Method of Attaching Molecules to Semiconducting Silicon

Titan Platform Designed to Deliver First-Time-Right, Predictable Mixed-Signal Silicon

Productivity and Process Advantages Key Factors in Success

SOI Industry Consortium Launches SOI Simply Greener

Research Boosts Graphene’s Potential to Unprecedented Heights

New Study Finds Electrons Flow Like Liquid in Graphene, Breaking Rules

Novel 3D Imaging Technique Captures In Situ Nanoparticle Self-Assembly

Nanoparticles That Boost Tomato Plant Growth

Orange Peel Nanoparticles: New Green Synthesis

Enhancing Slurry Stability in Lithium-Ion Batteries with Turbiscan Technology

PiFM and its Role in Nanoscale Chemical Imaging

Conversations on AFM: How AI is Automating Scanning Probe Microscopy

Sponsored Content

Comparing Spectroscopic Techniques for Nanoscale Analysis of Polyethylene Formation

How Photothermal AFM-IR Enables Nanoscale Defect Detection in Semiconductors

Overcoming the Limits of Traditional DLS in Lipid-Based Nanoparticle Manufacturing

Next-Generation Biological Imaging Using Raman-SEM