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Tegal Extends Deadline on Bid for its Nanolayer Deposition Technology Portfolio

US based Tegal has announced that it has extended the deadline for bidding for its nanolayer deposition technology (NLD)-based intellectual property portfolio. The deadline, which was to expire on September 30, 2011 has now been extended up to 5 pm, October 15, 2011.

The company decided on the extension as various semiconductor and IC equipment manufacturers had shown an interest in its portfolio. Tegal’s portfolio comprises a total of 35 global and local patents in the fields of plasma-enhanced atomic layer deposition (ALD), pulsed chemical vapour deposition (CVD) and NLD.

NLD is a technology which integrates the CVD, which is non-conformal and gives high throughput and ALD, which is highly conformal and gives low throughput. This technology helps semiconductor and IC equipment manufacturers to extend the life of hardware based on CVD processes without having the need to shift to ALD processes that are limited by pre-cursors.

The technical know-how and knowledge of Tegal has led to the invention of many devices such as LEDs, advance memory and microprocessors. The company is also responsible for the development of the sensing and filtering devices that are now used by most smart phones. The company has also invested in Sequel Power to develop various solar power plant projects and renewable energy projects around the world.

Source:

http://www.Tegal.com

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