45 Nano Lith Breakthrough From Japanese - News Item

A material that can be used for F2 lithography has been made by a Japanese manufacturer, Mitsui Mining and Smelting.

By using a fluorine laser with a lens made of calcium fluoride crystal without any of molecular oxygen they have been able to create 45 nanometer circuit lines on semiconductors.

Posted 18th August 2003

Tell Us What You Think

Do you have a review, update or anything you would like to add to this article?

Leave your feedback
Submit