The world's smallest continuous spirals have been created at Vanderbilt University in Nashville, Tennessee. The spirals react in a unique way to polarized infrared light, which makes them very hard to counterfeit - this property could be used to prevent counterfeiting of currency, credit cards, or ID cards.
Congratulation to Valentin Flauraud and co-authors for their recent publication in Nanoletters about Large-scale arrays of Bowtie Nanoaperture Antennas for Nanoscale Dynamics in Living Cell Membranes.
EULITHA, a Swiss startup company offering innovative lithography equipment and services for the nanotechnology, photonics and optoelectronic markets announced today the delivery of its unique PhableR 100 photolithography tool to the MESA + NanoLab of the University of Twente in the Netherlands.
Vistec Electron Beam GmbH, a leading supplier of electron-beam lithography systems, announced today that it has established a showroom facility in Schaumburg, IL to promote and demonstrate their Variable-Shaped Beam systems specifically for the US and North America market.
The new ZEISS MeRiT neXT mask repair tool hosts the innovative ZEISS low energy ebeam column, which enables the repair of smallest possible clear and opaque defects with the highest accuracy. The low energy beam increases the process resolution and simultaneously reduces side effects.
SEMTech Solutions, in partnership with Elionix, is pleased to announce the delivery of a 100kV Electron Beam Lithography (EBL) system to the City University of New York’s (CUNY) Advanced Science Research Center (ASRC).
Leading semiconductor equipment supplier Advantest Corporation announces that imec has selected its leading-edge F7000 electron-beam lithography system for installation at their research center in Leuven, Belgium. Imec is a world-renowned center for advanced research in microelectronics which was founded in 1984. The F7000 will be utilized at the nanoelectronics research center to conduct research and development into future leading-edge semiconductor-related technologies.
Vistec Electron Beam GmbH, a leading supplier of electron-beam lithography systems, announced today, that it has established a show room facility in Schaumburg, IL to promote and demonstrate their Variable Shaped Beam systems specifically for the US and North America market.
Heidelberg Instruments significantly extends its leadership in manufacturing of direct write lithography systems with the launch of MLA Maskless Aigner series of systems. Low to mid volume lithography traditionally consist of creating designs with a CAD software, followed by fabricating or purchasing a photomask and finally using a mask aligner or stepper to transfer the pattern on to the photoresist. For high volume manufacturing of sub-micron design nodes, this traditional process is required.
Rudolph Technologies, Inc. announced today that a major outsourced assembly and test (OSAT) manufacturer has placed a $12 million order for a follow-on JetStep® Advanced Packaging Lithography System and multiple NSX® Inspection Systems for use in their planned capacity expansion. The tools, which will ship this quarter and next, will be used in high-performance fan-out wafer level packaging (FOWLP) applications.