Mentor Graphics Enters into Multi-Year Software and Services Agreement with GLOBALFOUNDRIES

Mentor Graphics Corporation (NASDAQ:MENT) today announced that it has entered into a multi-year software and services agreement with GLOBALFOUNDRIES for EDA tools to support advanced IC development and manufacturing. As part of the agreement, GLOBALFOUNDRIES has adopted the Mentor Graphics Calibre® platform for the design and verification of complex semiconductor devices along with computational lithography and mask data preparation flows, targeting process technologies of 32/28 nanometers and below. In addition, GLOBALFOUNDRIES will team with the Mentor Graphics Worldwide Support organization to assist customers using Calibre tools as they develop new products at advanced process nodes.

“Our focus continues to be on providing the world’s largest semiconductor design companies with the fastest time-to-volume production in the foundry industry,” said Mojy Chian, senior vice president of design enablement at GLOBALFOUNDRIES. “Mentor Graphics technology and services are important additions to the robust design enablement infrastructure we have built to ensure that our customers can maximize the benefits of our technology. We chose Mentor Graphics for its leadership in physical verification and its comprehensive RET, OPC and mask data preparation solutions. The combination of Mentor’s tools and our Design for Manufacturing (DFM) capabilities will provide GLOBALFOUNDRIES customers with the fastest possible time to mask.”

“GLOBALFOUNDRIES’ partnership with Mentor constitutes a unique and far-reaching collaboration that is bringing leading-edge solutions to the world’s largest fabless design companies,” said Joseph Sawicki, vice president and general manager for the Design-to-Silicon division at Mentor Graphics. “This latest effort builds on the long-standing relationships between Mentor and GLOBALFOUNDRIES. It will allow GLOBALFOUNDRIES customers to optimize their designs using solutions that leverage the complete Calibre offering, including the integration of lithography and CMP process models developed for Calibre and a comprehensive set of DFM design capabilities on the Calibre and Olympus-SoC™ tool platforms.”

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