Raising CMP Technology to A New Level

Applied Materials, Inc., the global leader in Nanomanufacturing Technology™ solutions with a broad portfolio of innovative equipment, service and software products for the fabrication of semiconductor chips, flat panel displays, solar photovoltaic cells, flexible electronics and energy efficient glass, today raised CMP* technology to a new level while lowering system cost of ownership (CoO) with the launch of its Applied Reflexion® GT system for advanced metal CMP applications. The system's novel, dual-wafer design sets new benchmarks in CMP performance and productivity, delivering superior profile control and 60% higher throughput than competing systems. The Reflexion GT also dramatically cuts consumables cost, requiring up to 30% less slurry and processing twice as many wafers per polishing pad.

Key to the Reflexion GT system is its dual mode architecture, enabling two wafers to be processed simultaneously on each platen using independently-controlled Titan Contour polishing heads. (Photo: Business Wire)

“Today's copper-based logic and memory devices have more copper interconnect layers, requiring faster CMP processing and more efficient use of consumables,” said Lakshmanan Karuppiah, general manager of Applied's CMP business unit. “Like Applied's highly-successful Producer® GT™ CVD* platform, the Reflexion GT system is another dream machine for customers – combining innovations in CMP technology with dual-wafer processing to achieve best-of-breed performance. In addition to its high speed throughput, this new architecture allows customers to realize substantial savings in the cost of consumables, which typically comprises 70% of the total cost per wafer.”

Key to the Reflexion GT system's benchmark performance is its dual mode architecture, enabling two wafers to be processed simultaneously on each platen using independently-controlled Titan Contour™ polishing heads. After polishing is complete, a parallel-path, clean module featuring Applied's proven Marangoni™ vapor drying delivers highly-effective, water mark-free wafer cleaning. The system's proprietary, real-time profile and endpoint control technologies provide industry-leading, wafer-to-wafer uniformity.

The Reflexion GT system is available now for copper interconnect planarization and has demonstrated extendibility to tungsten applications. This innovative system adds to Applied's decade of leadership in CMP technology, with more than 2,700 systems at customer sites worldwide.

*CMP = chemical mechanical planarization; CVD = chemical vapor deposition

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Applied Materials Inc.. (2019, March 18). Raising CMP Technology to A New Level. AZoNano. Retrieved on March 05, 2024 from https://www.azonano.com/news.aspx?newsID=14867.

  • MLA

    Applied Materials Inc.. "Raising CMP Technology to A New Level". AZoNano. 05 March 2024. <https://www.azonano.com/news.aspx?newsID=14867>.

  • Chicago

    Applied Materials Inc.. "Raising CMP Technology to A New Level". AZoNano. https://www.azonano.com/news.aspx?newsID=14867. (accessed March 05, 2024).

  • Harvard

    Applied Materials Inc.. 2019. Raising CMP Technology to A New Level. AZoNano, viewed 05 March 2024, https://www.azonano.com/news.aspx?newsID=14867.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Your comment type
Submit
Azthena logo

AZoM.com powered by Azthena AI

Your AI Assistant finding answers from trusted AZoM content

Your AI Powered Scientific Assistant

Hi, I'm Azthena, you can trust me to find commercial scientific answers from AZoNetwork.com.

A few things you need to know before we start. Please read and accept to continue.

  • Use of “Azthena” is subject to the terms and conditions of use as set out by OpenAI.
  • Content provided on any AZoNetwork sites are subject to the site Terms & Conditions and Privacy Policy.
  • Large Language Models can make mistakes. Consider checking important information.

Great. Ask your question.

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.