Ultratech, Inc. (Nasdaq:
UTEK), a leading supplier of lithography and laser-processing systems used
to manufacture semiconductor devices, today introduced its newest lithography
system, the Sapphire 100 for high-brightness light-emitting diode (HBLED) manufacturing.
By leveraging its lithography and technology leadership, the Sapphire 100
lithography system is designed to enable Ultratech customers to meet the growing
demand for illumination products with HBLED technology. Today this demand is
driven by strong growth in LED backlighting applications, with even greater
potential from energy savings as the world intensifies its energy conservation
efforts with the implementation of LED-based, solid state lighting. Currently
in beta, Ultratech's production-ready Sapphire 100 lithography system will be
available in the second half of 2010.
According to Strategies Unlimited, illumination is expected to become the fastest
growing segment of HBLEDs (2007 - 2012 CAGR of 36 percent). Future growth in
the LED lighting market is expected to come from a mix of sources, such as street
and parking lights, and indoor residential and office applications. It is estimated
that the potential annual energy cost savings is in the $10 billion - $100 billion
per country. Building on this expectation, Ultratech has designed the Sapphire
100 to provide competitive advantages for its HBLED manufacturing customers.
Doug Anberg, Ultratech's vice president of advanced stepper technology, noted,
"Today, approximately 25 percent of electricity is used for lighting. As
energy conservation efforts continue to increase, we expect lighting products
with HBLED technology to be in high demand. The development of our Sapphire
100 system is an example of our long track record of anticipating industry trends
and providing high value to meet the changing needs of our global customers.
We look forward to working with leading HBLED manufacturers and to establish
their competitive advantages with Ultratech lithography systems for the burgeoning
Sapphire 100 Lithography System
Building upon the cost and performance advantages of the highly reliable 1500
platform, the Sapphire 100 system offers the added advantage of Ultratech's
patented Machine Vision System (MVS). The MVS delivers alignment flexibility
with significant advantages over standard alignment techniques. The Sapphire
100 was specifically designed to meet the wide range of lithography needs for
the HBLED manufacturing industry.