Posted in | Nanoenergy

Applied Seals to Design Leading-Edge seals for 22 nm Technology Node of Semiconductor Manufacturing

Applied Seals North America has launched an applications and design facility at its headquarters located in Silicon Valley. The center will enable the company to address customer issues with seals, including o-rings applicable in the 22nm technology segment of semiconductor production.

Advanced perfluoroelastomer or FFKM, seals are used in tools to enable semiconductor developers to create and maintain sterile conditions conducive to producing ICs. A specialized applications laboratory will allow developers of nano-chips and wafer-fabrication tools to help address sealing problems. ASNA will accept customer seals for analysis.

According to Dalia Vernikovsky, president and general manager of ASNA, the company will now be able to deliver rapid diagnosis and remedies to sealing problems faced by semiconductor developers.


The center will be able to measure both standard and customized seals and glands, the roughness of product surfaces to within 50nm. The metrology information will enable finite element analysis (FEA) in order to enhance the structure and fabrication of sealing equipment for individual applications. The metrology equipment features magnifying optical comparators, CCTV-enabled microscopes, calipers and gauges.

The center will allow the company to develop sealing solutions used in production, such as immersion lithography and hafnium deposition. Design engineers in Silicon Valley also network with the company’s design and development divisions in Taiwan.

Source: http://www.appliedsealsna.com

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Chai, Cameron. (2019, February 12). Applied Seals to Design Leading-Edge seals for 22 nm Technology Node of Semiconductor Manufacturing. AZoNano. Retrieved on March 31, 2020 from https://www.azonano.com/news.aspx?newsID=22276.

  • MLA

    Chai, Cameron. "Applied Seals to Design Leading-Edge seals for 22 nm Technology Node of Semiconductor Manufacturing". AZoNano. 31 March 2020. <https://www.azonano.com/news.aspx?newsID=22276>.

  • Chicago

    Chai, Cameron. "Applied Seals to Design Leading-Edge seals for 22 nm Technology Node of Semiconductor Manufacturing". AZoNano. https://www.azonano.com/news.aspx?newsID=22276. (accessed March 31, 2020).

  • Harvard

    Chai, Cameron. 2019. Applied Seals to Design Leading-Edge seals for 22 nm Technology Node of Semiconductor Manufacturing. AZoNano, viewed 31 March 2020, https://www.azonano.com/news.aspx?newsID=22276.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Submit