Fujifilm to Work with Semantech on Resist Issues of Extreme Ultraviolet Lithography
Sematech declared that Fujifilm is now part of the Resist Materials and Development Center (RMDC) and would be working with them on critical resist issues in extreme ultra violet (EUV) lithography.
The RMDC is part of the College of Nanoscale Science and Engineering (CNSE) at the University at Albany. Fujifilm is planning to contribute to specific research areas such as minimization of line edge roughness (LER) in images that are below 22nm and testing imaging particles that are EUV sensitive and in new resist materials resolution.
Takahiro Goto, who is in charge of Electronic Materials Research Laboratories at Fujifilm, stated that the collaboration will enable Fujifilm to contribute towards the markets for semiconductor manufacturing and electronic materials. He assured that Fujifilm would deliver the materials and the processes that favour innovative developments at Sematech. John Warlaumont, the VP of Advanced Technologies at Sematech, was positive that the joint effort would enhance RMDC’s capabilities in handling critical resist issues in materials and also speed up Sematech’s quest for new solutions.
Sematech contribution to this partnership is backed with hardware and research experience in semiconductors and market leadership. Fuji film on the other hand brings in advanced semiconductor materials and related processes, which would make this partnership a fruitful one. Throughout the research work RMDC would provide Fuji film access to two micro-exposure tools and other metrology tools that are housed at the University of California, Berkeley and University at Albany’s College of Nanoscale Science and Engineering. Research at RMDC is focussed on developing EUV resist processes that adhere to strict specifications such as resolution, line width roughness and sensitivity specifications required for EUV insertion.
Please use one of the following formats to cite this article in your essay, paper or report:
APA
Chai, Cameron. (2019, February 12). Fujifilm to Work with Semantech on Resist Issues of Extreme Ultraviolet Lithography. AZoNano. Retrieved on March 04, 2026 from https://www.azonano.com/news.aspx?newsID=22530.
MLA
Chai, Cameron. "Fujifilm to Work with Semantech on Resist Issues of Extreme Ultraviolet Lithography". AZoNano. 04 March 2026. <https://www.azonano.com/news.aspx?newsID=22530>.
Chicago
Chai, Cameron. "Fujifilm to Work with Semantech on Resist Issues of Extreme Ultraviolet Lithography". AZoNano. https://www.azonano.com/news.aspx?newsID=22530. (accessed March 04, 2026).
Harvard
Chai, Cameron. 2019. Fujifilm to Work with Semantech on Resist Issues of Extreme Ultraviolet Lithography. AZoNano, viewed 04 March 2026, https://www.azonano.com/news.aspx?newsID=22530.
We're committed to providing free access to quality science. By registering and providing insight into
your preferences you're joining a community of over 1m science interested individuals and help us to
provide you with insightful content whilst keeping our service free.
or
Terms
While we only use edited and approved content for Azthena
answers, it may on occasions provide incorrect responses.
Please confirm any data provided with the related suppliers or
authors. We do not provide medical advice, if you search for
medical information you must always consult a medical
professional before acting on any information provided.
Your questions, but not your email details will be shared with
OpenAI and retained for 30 days in accordance with their
privacy principles.
Please do not ask questions that use sensitive or confidential
information.
Read the full Terms & Conditions.