Posted in | Nanoelectronics

Mentor Graphics Offers CMP Modules for 28 nm and Calibre LFD Kits for 20-28 nm

Mentor Graphics has introduced new functionalities in its design to silicon solutions, which include the enhanced CMP modules for 28 nm and new Calibre LFD kits for 20 and 28 nm, for GLOBALFOUNDRIES’ third-generation signoff-ready design enablement for advanced IC production.

Latest technologies endorse GLOBALFOUNDRIES’ manufacturing analysis and scoring approach, which is executed utilizing the critical feature analysis of the Calibre platform, and can be utilized to improve SoCs and IP blocks at all layers for decreasing the production inconsistency of SoC products.

The Calibre platform also endorses GLOBALFOUNDRIES’ pattern-based design rule checking (DRC) technology called DRC+, which determines prospective yield-restricting litho designs, while sustaining significant performance enhancement over complete litho simulation methods. Other advances include enhanced interaction with route tools such as the Mentor Olympus-SoC tool and place and other design flows to avoid late-stage signoff breaches.

GLOBALFOUNDRIES and Mentor Graphics are not only involved in the design flow but also advancing to produce data captured in the study process more valuable for product designers and engineers, as they correct current designs and bring in new designs in the similar process node. These modifications could speed up the maturity process of a given node, thus assuring overall output and profitability.

The Vice President of Design Infrastructure at GLOBALFOUNDRIES, Andy Brotman stated that the Mentor solution offers a sole, reliable environment scenario for harnessing the interface between the fab and designers for the complete life cycle of a production process node.

Source: http://www.mentor.com

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