One of the key technical challenges when working towards the commercial realisation of graphene and related 2D materials is the development of robust fabrication techniques for deposition, etching and integration with other processes in a device-fabrication facility.
Oxford Instruments will host a webinar on 12th November that will focus on recent advances in research from academic speakers at the forefront of their fields, as well as from Oxford Instruments scientists.
What you will gain from attending this webinar:
- Understanding of the use of controlled etching processes for novel 2D heterostructures – by Dr Andrey V Kretinin (University of Manchester, UK)
- Growth and characterization of graphene and hexagonal boron nitride via CVD and plasma-enhanced CVD – by Dr Ravi Sundaram (Oxford Instruments, UK)
- Atomic layer deposition for the fabrication of high-k dielectrics and metal contacts on graphene – by Dr A A Bol (Eindhoven University of Technology, Netherlands)
Comments Frazer Anderson, Research Business Group Director at Oxford Instruments Plasma Technology, ‘Oxford Instruments is opening up the fascinating world of graphene and other 2D materials with our innovative toolbox of techniques and products, for all stages of research through to production, helping our partners to reveal even more of the nano-world. This webinar examines various aspects of research undertaken by our partners and our company, using our advanced instrumentation.’
As a leading supplier of high technology tools and systems for research and industry, specialising in equipment that can fabricate, manipulate, characterise and analyse matter at the nanoscale, Oxford Instruments engages with its customers to enable graphene research, tailoring these systems to suit customer requirements. To view the ‘Exploring flatlands: fabrication technologies’ webinar: www.oxford-instruments.com/Exploring-Flatlands
About Oxford Instruments Plasma Technology
Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for the etching of nanometre sized features, nanolayer deposition and the controlled growth of nanostructures.
These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition, deep silicon etch and physical vapour deposition. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.