Ultratech, Inc., a leading supplier of ALD systems, as well as lithography, laser-processing and inspection systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today introduced the Ultratech Cambridge NanoTech Savannah G2 atomic layer deposition (ALD) system. Since its introduction in 2004, the Savannah product line has become the industry-leading commercial ALD system used for research and development activities.
The Savannah G2 platform incorporates a wide range of advanced field-upgradable options intended to aid serious researchers in expanding their portfolio of available ALD films, as well as allow them to characterize the films in real time. Among the Savannah G2's array of options, a unique low vapor precursor delivery system has been developed to enable the growth of novel materials including single- and multi-component films from Perovskite, Yttrium, Lithium, and the rare earth families. Additional options such as ellipsometry, Quartz Crystal Microbalance (QCM), and mass spectrometry allow for the simultaneous growth of ALD films and the real-time characterization of the deposition process, all of which are indispensible capabilities for process development and optimization activities.
Ultratech Cambridge NanoTech Vice President of Research and Engineering Ganesh Sundaram noted, "With 400 ALD systems in the field, Ultratech Cambridge NanoTech's tools have been used in over 800 published papers in peer-reviewed journals. As a result, universities and government institutions, as well as corporate research and development centers, are using our ALD systems to break ground on some of the most interesting applications for thin film use. Today, the Savannah G2 system represents a highly extendable ALD platform, engineered to meet the needs of both routine and extremely challenging ALD thin-film research and development for today's and tomorrow's requirements."