Annealsys

Annealsys designs and manufactures Rapid Thermal Processing / Rapid Thermal Annealing (RTP/RTA) and Chemical Vapor Deposition (DLI CVD, DLI ALD, MOCVD and RTCVD) systems for research laboratories and companies for semiconductor, MEMS, LEDs, sensors, nanotechnologies and photovoltaic applications.

RTP applications include:

• Ohmic contact annealing, implant annealing
• Rapid Thermal Oxidation (RTO), Rapid Thermal Nitridation (RTN)
• Silicon smoothening
• SiC oxidation, silicon carbonization
• Diffusion, densification and crystallization
• Selenization, Sulfurization
• RTCVD of graphene and hexagonal boron nitride
• RT-ALD of Al2O3, ZnO, etc.

Annealsys provides Direct Liquid Injection (DLI) CVD and ALD systems offering the highest process versatility for development of new materials by utilization of low vapor and thermally unstable precursors. Our DLI-CVD systems can handle most of the materials of the periodic table and offer unique process and material development capabilities.

DLI-CVD / ALD applications include:

• Simple and multi-metallic oxides
• 2D materials: graphene, h-BN and TMDs (MoS₂, WS₂, etc.)
• nitrides, metals and alloys.

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