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3D Integration and Advanced Lithography Challenges Discussed in SUSS MicroTec Japan Seminar

SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, hosted the SUSS MicroTec Japan Seminar 2012 on December 4, at the Hyatt Regency Tokyo. In two parallel tracks the latest developments in 3D Integration and Next Generation Lithography as 193i, EUVL and NIL were presented and discussed. Both seminars attracted approximately 200 attendees.

From SUSS MicroTec AG 7 Dec 2012

Dow Unveils Advances in EUV Lithography Development

Dow Electronic Materials, a business unit of The Dow Chemical Company, today announced two key commercial-ready technologies for leading-edge semiconductor and printed circuit board (PCB) manufacturing.

From Dow Chemical Company 4 Dec 2012

Wafer Bonding and Lithography Equipment Supplier Completes Cleanroom Expansion

EV Group (EVG) a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, announced the completion of its newly expanded cleanroom IV facility at its corporate headquarters in Austria.

From EV Group 28 Nov 2012

New Nanostructuring Technique from SCHOTT Technology Group

The SCHOTT technology group has developed a nanostructuring technique for surfaces that already ranks among the important emerging technologies: so-called nanoimprint lithography. This technological platform should provide the basis for a wide range of innovative applications including decorative stainless steel appearances for glass, OLED applications and even photonic crystals.

28 Nov 2012

ENIAC JU Honors IMPROVE and LENS Projects for Nanotechnology Innovation

Two research projects with a combined budget approaching 70 million euro achieved significant advances in semiconductor manufacturing efficiency and have been recognized with the 2012 ENIAC JU INNOVATION AWARD at the European Nanoelectronics Forum.

22 Nov 2012

Nanolito 2012 Workshop Held in San Sebastian

CIC nanoGUNE gathered over 70 international experts in lithography between the 13 and 15 November during the Nanolito 2012 workshop held at the centre’s installation in San Sebastián.

16 Nov 2012

New Mask Defect Review Tool from Advantest for Advanced Photomasks

Advantest Corporation today announced that it has developed a new mask defect review tool, the Mask DR-SEM E5610, for reviewing and classifying ultra-small defects in photomask blanks.

16 Nov 2012

New Electron Beam Lithography System from Advantest for 1Xnm Technology Nodes

Advantest Corporation (TSE: 6857, NYSE: ATE) today announced that it has developed a new EB (electron beam) lithography system, the F7000, with superior resolution performance meeting the requirements for 1Xnm technology nodes. The F7000 supports substrates of diverse materials, sizes, and shapes, including nanoimprint templates as well as wafers, and is optimized for diverse applications such as advanced LSIs, photonics, MEMS, and other nano-processes.

15 Nov 2012

Scientists Create Complex 3-D Structures by Combining Ion Processing and Nanolithography

The fabrication of many objects, machines, and devices around us rely on the controlled deformation of metals by industrial processes such as bending, shearing, and stamping. Is this technology transferrable to nanoscale? Can we build similarly complex devices and machines with very small dimensions?

20 Oct 2012

Successful Commercial Metallization of Optical Images Using Nanotechnology

Nanotech Security (NTS) reports successful commercial metallization of optical images using nanotechnology. The company produces advanced authentication and security features utilizing nanotechnology-based optics.

25 Sep 2012