Rudolph Technologies, Inc. announced today that a leading outsourced assembly and test facility (OSAT) has placed an order for the JetStep® Lithography System for the semiconductor advanced packaging industry’s first panel manufacturing line.
Research and Markets has announced the addition of the "Nanopatterning - Global Strategic Business Report" report to their offering.
Ultratech, Inc., a leading supplier of lithography, laser-processing and inspection systems used to manufacture semiconductor devices and high-brightness LEDs (HBLEDs), as well as atomic layer deposition (ALD) systems, today announced that it has received a large multiple-system order from a leading semiconductor manufacturer for its advanced packaging AP300 lithography systems.
The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of its fourth annual eBeam Initiative members' perceptions survey. A record 64 industry luminaries representing 35 different companies from across the semiconductor ecosystem—including chip design, equipment, materials and manufacturing as well as photomasks—participated in this year's survey.
SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry and related markets, has received an order for multiple SUSS MicroTec Photonic Systems lithography tools in Q3 2015 from a leading semiconductor manufacturer. The strategically important order includes multiple DSC300 Gen2 projection scanners, which are produced at the company’s facility in Corona, USA. The order volume is in the high single-digit million Euro range.
The National Science Foundation has selected the Cornell NanoScale Science and Technology Facility (CNF) to be part of the newly established National Nanotechnology Coordinated Infrastructure (NNCI). Cornell will receive $8 million from the federal agency over five years.
Mycronic AB (publ), has received yet another order for a mask writer, built on the Prexision platform, replacing an older system for manufacturing of display photomasks. The system, sold to a customer in Asia, is scheduled to be delivered during the second half of 2016.
EULITHA, a Swiss startup company offering innovative lithography equipment and services for the nanotechnology, photonics and optoelectronic markets announced today that it received a new order for its unique PhableR 100 photolithography tool from the Changchun Institute of Optics, Fine Mechanics and Physics (CIOMP), China.
SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, and the Singh Center for Nanotechnology at the University of Pennsylvania (Penn) are announcing a cooperation agreement in the field of nanoimprint technologies.
Mycronic AB (publ), has received an order for a mask writer replacing an older system for manufacturing of display photomasks from a customer in Asia. It is estimated that the system will be delivered during the third quarter of 2016.