Nanolithography News

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Applied Materials Hosts Forum to Explore Emerging Lithography Technologies

Without robust and affordable next-generation lithography, the current semiconductor roadmap could change dramatically. For 22nm and beyond, patterning candidates such as EUVL*, nano-imprint, direct write and optical dou...

From Applied Materials Inc. 13 Feb 2009

SEMATECH Experts Report Progress on Enabling EUVL

SEMATECH and International SEMATECH Manufacturing Initiative (ISMI) experts will present world-leading research and development results on extreme ultraviolet (EUV) manufacturability and extendibility, alternative lithog...

11 Feb 2009

Process that may Revolutionize the Manufacture of Nano-Devices

Yale engineers have created a process that may revolutionize the manufacture of nano-devices from computer memory to biomedical sensors by exploiting a novel type of metal. The material can be molded like plastics to create features at the nano-scale and yet is more durable and stronger than silicon or steel.

11 Feb 2009

Strength Through Diversity - Fraunhofer Researchers Show Innovative Developments at nano tech 2009

Tiny light-emitting diodes with optical microsystems that can produce all the colors of the rainbow, a new method for producing printed circuit boards - Fraunhofer researchers are showing innovative developments at the nano tech 2009 exhibition in Japan.

10 Feb 2009

Combination of X3 and 32 Nanometer Represents Breakthroughs in Size and Density

SanDisk Corporation (NASDAQ: SNDK) and Toshiba Corporation today announced the co-development of multi-level cell (MLC) NAND flash memory using 32-nanometer (nm) process technology to produce a 32-gigabit (Gb) 3-bits-per-cell (X3) memory chip.

10 Feb 2009

XLR 600iX Delivers Improved On-Wafer Performance to Chipmakers

Cymer, Inc. (Nasdaq:CYMI), the market's leading developer of light sources used to pattern advanced semiconductor chips, announced today that its advanced XLR 600i-originally introduced as a 90 watt (W) light source-...

From Cymer, Inc. 10 Feb 2009

Luminescent Advances Computational Lithography Lead

Luminescent Technologies, Inc., the pioneer and first-to-market provider of computational lithography solutions for the global semiconductor industry, continues to advance its lead, with six major semiconductor manufacturers in Europe, Japan, Korea, Taiwan, and the US now using its Inverse Lithography Technology (ILT) to develop computational solutions in a mix of environments -- from production at the 50- nm node to development at 36-nm, 28-nm and 22-nm nodes.

9 Feb 2009

Nanolithography News

Applied Materials Hosts Forum to Explore Emerging Lithography Technologies

SEMATECH Experts Report Progress on Enabling EUVL

Process that may Revolutionize the Manufacture of Nano-Devices

Strength Through Diversity - Fraunhofer Researchers Show Innovative Developments at nano tech 2009

Combination of X3 and 32 Nanometer Represents Breakthroughs in Size and Density

XLR 600iX Delivers Improved On-Wafer Performance to Chipmakers

Luminescent Advances Computational Lithography Lead

Educational Forums to Focus on Accelerating Technology Innovations and Manufacturing Solutions

Report Analyzes the US Market for Nanotools

SVTC Technologies Announces Partnership with Entrepix to Provide 300 mm CMP Development and Production Services

6-DOF MagLev Systems for Advanced Packaging Introduced at SEMICON West 2026, New From PI

Dual-Target Nanoparticles Reprogram Macrophages and Improve Survival in Experimental Sepsis

Sparking Nanometal Oxides Strengthens Starch-Based Bioplastic Surfaces

Diimmonium Nano-Agents Improve Photoacoustic Imaging Contrast At 1700 nm

Hybrid Immune-Cell Nanoparticles Reduce Inflammation and Bone Loss in Periodontitis

How DNA Nanotechnology Is Transforming Protein and Materials Research

How First Graphene is Turning Potential into a Reality

Smarter, Faster Stability Testing: Improving Detergent and Cosmetic Formulation Development

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