First Nano, a division of CVD Equipment Corporation (Nasdaq: CVV) introduced today the EasyTube™ 101, a new Chemical Vapor Deposition research and development tool platform as part of the growing EasyTube™ family of products.
This platform is designed to address the budget limitations and growing safety concerns for the university or industrial researcher at the forefront of technology in new processes for Nanotechnology and Energy related materials.
The EasyTube™ 101 platform is customer configured and can be upgraded or re-configured in the field for future process needs, thus enhancing its price/performance value. In the coming months, more process support information will be made available on our EasyTube™ product websites, thus providing increased support for our steadily growing worldwide EasyTube™ customer base.
Each EasyTube™ 101 system can be configured for a wide range of processes including ALD, APCVD, LPCVD, RTP, Annealing, Diffusion, etc. Most options and system reconfigurations can be added or installed in the field. The EasyTube 101 is controlled by our proprietary real-time LabWindow™ based process control software CVDWinPrC™ that provides recipe driven process control, real-time graphing and automatic data logging for optimal process reproducibility. It also communicates with a PLC to handle the hardware interface and provide appropriate, industrial level safety systems and includes a standard Web interface for remote training, software upgrades, system reconfiguration, support and trouble shooting.
For research size samples the EasyTube™ 101 platform provides most of the capabilities of the advanced EasyTube™ 2000 and EasyTube™ 3000 platforms. The basic EasyTube™ 101 is attractively priced and provides many built in industrial level safety and process capabilities that are typically only found on more expensive industrial platforms and are missing on home-made systems. Since research needs can change and budgets can limit the purchase of the more advanced systems, the EasyTube™ 101 is the optimal chemical vapor deposition research and development system that can be upgraded in the future as new or different process needs arise and additional funding becomes available.