Posted in | News | Nanofabrication

SUSS MicroTec Launch First Holistic In-Fab EUVL Mask Management System

Today SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, launched its new MaskTrack Pro InSync - the first holistic in-fab EUVL mask management offering. MTP InSync is a stand-alone or clustered handling system which seamlessly synchronizes mask cleaning, handling, inspection and storage in a single controlled environment. MTP InSync operates in a zero particle regime maintaining perfect mask integrity when entering the vacuum environment of the EUVL Scanner.

"EUV lithography places tremendous demands on mask integrity at point-of-exposure," said Frank P. Averdung, President and CEO of SUSS MicroTec AG. "Only MaskTrack Pro InSync, delivers the technology necessary to achieve a zero particle mask management environment, enabling chipmakers to capitalize on important lithography scanner availability. This state-of-the-art mask management system establishes our continued commitment to providing our customers with a mask integrity infrastructure for Next Generation Lithography."

The MaskTrack Pro InSync is the first and only mask management system available in the market that can interface directly with the specific EUV Dual Pod in a fully-controlled environment. Designed to cluster mask cleaning, mask transfer and storage of the important inner pod in a pristine environment, as well as the optional integration of a particle detection system and inner pod cleaning, MTP InSync provides a unified approach to mask management throughout the lifetime of the mask. MTP InSync's design allows the direct transfer of the Dual Pod from the scanner to the MaskTrack Pro reticle cleaning tool.

Shipment of the first MTP InSync to imec in Belgium is scheduled in August 2011.

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    SUSS MicroTec AG. (2019, February 12). SUSS MicroTec Launch First Holistic In-Fab EUVL Mask Management System. AZoNano. Retrieved on December 01, 2021 from https://www.azonano.com/news.aspx?newsID=22981.

  • MLA

    SUSS MicroTec AG. "SUSS MicroTec Launch First Holistic In-Fab EUVL Mask Management System". AZoNano. 01 December 2021. <https://www.azonano.com/news.aspx?newsID=22981>.

  • Chicago

    SUSS MicroTec AG. "SUSS MicroTec Launch First Holistic In-Fab EUVL Mask Management System". AZoNano. https://www.azonano.com/news.aspx?newsID=22981. (accessed December 01, 2021).

  • Harvard

    SUSS MicroTec AG. 2019. SUSS MicroTec Launch First Holistic In-Fab EUVL Mask Management System. AZoNano, viewed 01 December 2021, https://www.azonano.com/news.aspx?newsID=22981.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Submit