Posted in | News | Nanoanalysis

Sentech Introduce a New PEALD System

Atomic layer deposition (ALD) is a layer-by-layer deposition process of very thin films with conformal coating on 3D structures. Precise control of thickness and film properties is facilitated by adding precursors in separate steps into the vacuum chamber during process cycle. Plasma enhanced atomic layer deposition (PEALD) is an advanced method of extending the capabilities of ALD by applying radical gas species rather than water as oxidizer during the deposition process.

34.6 nm PEALD-Al2O3 with very good homogeneity of +/ 1 % on 4" wafer at 200°C substrate temperature

Based on many years of experience in developing and manufacturing PECVD and ICPECVD equipment, including the proprietary planar triple spiral antenna ICP source, SENTECH proudly announces the launch of its first PEALD system. The new ALD system enables both thermal and plasma assisted operation and deposition monitoring using SENTECH ellipsometers. SENTECH offers leading edge ultra-fast in-situ ellipsometers for monitoring layer-by-layer film growth applying laser ellipsometry as well as wide range spectroscopic ellipsometry.

The first PEALD system was already set in operation at the TU Braunschweig for the deposition of extremely uniform and dense thin oxide films like Al2O3 and ZnO. For the deposition of Al2O3, TMA (C3H9Al) and plasma generated atomic oxygen 'O' were utilized at substrate temperatures from 80°C to 200°C.

The PEALD films exhibit excellent thickness uniformity and very small variation of the refractive index measured with SENTECH spectroscopic ellipsometers. 2D uniformity plots are shown below.


Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Sentech Instruments. (2019, February 12). Sentech Introduce a New PEALD System. AZoNano. Retrieved on March 31, 2023 from

  • MLA

    Sentech Instruments. "Sentech Introduce a New PEALD System". AZoNano. 31 March 2023. <>.

  • Chicago

    Sentech Instruments. "Sentech Introduce a New PEALD System". AZoNano. (accessed March 31, 2023).

  • Harvard

    Sentech Instruments. 2019. Sentech Introduce a New PEALD System. AZoNano, viewed 31 March 2023,

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Your comment type