Leading manufacturer of plasma etch and deposition processing systems Oxford Instruments Plasma Technology, recently won an order from Nanjing University of Post and Telecommunications, based in Nanjiang, Jiangsu, China for multiple plasma etch systems to be used for silicon and III-V etching.
The highly configurable PlasmaPro 100 systems offer an extensive range of processes, making them eminently suitable for the nanotechnology research being undertaken by Nanjing University. PlasmaPro 100 process modules are built on 200mm platforms, with single wafer and multi-wafer batch capability. The process modules offer excellent uniformity and high throughput processes on a range of applications.
“As a leading research centre in China we conducted a rigorous tender process and decided on Oxford Instruments for their state-of-the-art processing equipment that is key to our successful research”, said Dr. Huang Xiaoming of the Nanjing University of Post and Telecommunications, “The process modules offer excellent uniformity and high throughput processes, which together with a global customer support network, and low cost of ownership made this the system of choice for our University.”
Receiving a multiple system order from this respected Chinese university is great news for us. We are committed to providing our research customers with technologically innovative solutions through leading edge flexible process equipment. Our PlasmaPro etch tools, installed in the Nanjing University cleanroom will enable a wide range of research programs utilising their capabilities in III-V and silicon etching.
Frazer Anderson, Strategic Marketing and Business Development Director at Oxford Instruments Plasma Technology