Posted in | News | MEMS - NEMS | Nanoelectronics

Nanometrics Introduces New System for Critical Dimension, Overlay Metrology

Nanometrics Incorporated has introduced the IVS 185 system, capable of making critical dimension (CD) and overlay measurements using the same metrology recipe while achieving higher productivity. The ultra-low footprint tool targets 50mm to 200mm wafer production requirements and offers unsurpassed mean time between failure (MTBF) capabilities. The IVS 185 will begin shipping to Nanometrics’ customers this month.

Nanometrics’ newest product is an extension of its IVS 165 system, a stable, mature platform with more than 200 systems installed worldwide. Among its many advantages, the new IVS 185 has a footprint that is 20 percent smaller than its predecessor, and Nanometrics guarantees an industry-leading 1,800 hours MTBF. These features benefit manufacturers of semiconductors, compound semiconductors and micro-electro-mechanical systems (MEMS) during R&D, process development and volume production.

Another unique characteristic of the IVS 185 is its Multi-Z element, which enables measurement of up to four planes in a consistent field of view inside a single measurement sequence. The Multi-Z component also is capable of performing as many as 10 separate measurements at the same time, maximizing data collection and throughput.

“The IVS 185’s capabilities far surpass anything of the like currently on the market regarding reliability, quality and functionality,” said John D. Heaton, president and chief executive officer of Nanometrics. “Since it addresses numerous manufacturing needs, this product appeals to customers across the board. The debut of the IVS 185 also extends our commitment to offering our customers the most advanced yet cost-effective CD and overlay metrology tools available today.”

27th February 2007

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