First Nano, a division of CVD Equipment Corporation has announced today the shipment of our first EasyTube 6000 Chemical Vapor Deposition system. The multi-tube EasyTube 6000 horizontal system is specifically designed for the Research, University and Laboratory market and is capable of processing up to 100 - 6" diameter or smaller wafers. The system is available with processes for research applications in the Semiconductor, MEM, Nanotechnology and Solar Cell markets.
The EasyTube 6000 is another addition to our line of EasyTube systems that are aimed at offering the research community quality performance, safe operation and production grade equipment at a low cost of ownership. All EasyTube systems are equipped with our proprietary WINPRC real-time software to enable optimization of all process parameters. The EasyTube 6000 has a small footprint, is modular in design and is offered with Atmospheric and Low- Pressure Chemical Vapor Deposition processes.
In the fourth quarter of 2007, we will be installing an EasyTube 6000 in our "Open Laboratory" to further our ongoing relationships with the research community. The system will be used for customer demonstration, material processing and developing additional processes for CNT, Solar and MEM applications. The system will give us nine (9) operational deposition systems in our laboratory for further product and materials development.