Six Micrograph Contest Winners Announced at EIPBN Conference

The 52nd International Electron Ion and Photon Beam Technology and Nanofabrication (EIPBN) Conference announced six Micrograph Contest winners at its annual Conference held this year in Portland, Oregon May 27-30.

The 2008 Grand Prize was won by T. Pinedo and D. Peyrade of the ColloNa team LTM-CNRS in France for a micrograph of self-assembled 1um and 200nm polystyrene beads taken at 18,000x magnification with an SEM Hitachi 4000 electron microscope. Other winners included micrographs taken with ion microscopes and optical microscopes and a video taken with an electron microscope.

"The EIPBN Micrograph Contest attracts many bizarre and beautiful images taken by engineers and scientists in pursuit of cutting-edge technology," said Dr. Randall, vice president of Zyvex Labs. "The most amazing images are often a result of what went wrong and what can be learned from experimentation."

Dr. John Randall has been running the contest for the EIPBN Conference for 14 years. Zyvex, a leading nanotechnology company, has hosted the contest since 2001. All of the winners and honorable mentions are available on the Zyvex Labs website at: http://www.zyvexlabs.com/EIPBNuG/uGraph.html.

The EIPBN Conference is the world's leading symposium on lithography and nanofabrication. The conference attracts researchers from all over the world to present papers on science and engineering of fabricating, electronic, storage, mechanical, biological, and other devices and structures at the nano-scale.

The 2009 EIPBN Conference will be held May 26-29, 2009 at the Marco Island Marriott Beach Resort in Marco Island, Florida.

The International Electron Ion and Photon Beam Technology and Nanofabrication (EIPBN) Conference is at http://www.eipbn.com/.

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