Mattson Technology, Inc. (NASDAQ: MTSN), a leading supplier of advanced process equipment used to manufacture semiconductors, today announced that its Millios™ system, which has been upgraded with the latest temperature measurement and control features at the Fraunhofer Center Nanoelectronic Technologies (CNT), has been selected for joint projects with CNT's leading IC partners for the development of advanced millisecond anneal applications at the 3X nanometer technology nodes and below.
"CNT's objective is to accelerate the introduction of new semiconductor technologies from R&D to production," said Fraunhofer CNT's Professor Dr. Peter Kücher. "We look forward to continuing to work with Mattson Technology to develop enabling process technologies that will help our semiconductor partners achieve increasingly smaller geometries and fabricate more powerful chips in the next generation of IC manufacturing."
"The Millios installed at this key semiconductor and nanoelectronics research center was selected for the system's demonstrated processing flexibility and unmatched temperature measurement and control to address critical transistor scaling challenges," said Andreas Toennis, senior vice president and general manager of Mattson Technology's Thermal Products Group. "Built on Mattson's production-proven Helios platform, Millios features a patented arc lamp technology that provides enhanced thermal control for advanced applications -- including the formation of gate stacks, nickel silicide, and ultra-shallow junctions -- through the sub-2X nanometer regime. We are excited to collaborate with CNT and its partners to develop leading-edge anneal applications to help our customers fabricate their most advanced device designs at current and future technology nodes."