Advantest Corporation (TSE: 6857, NYSE: ATE) today announced availability of its new SEM-based Critical Dimension (CD) measurement system for next-generation photomasks and patterned media.
The E3630 is fully compatible with Advantest’s existing E3610/E3620 CD-SEM measurement systems and software, and boasts 30% improved linewidth repeatability.
As semiconductor device features continue to shrink, photomask patterning challenges have created new requirements for highly precise, stable metrology. Advantest’s E3600 series of CD-SEM measurement systems is already in use by multiple leading semiconductor and photomask manufacturers.
The E3630 features a newly developed objective lens and ultra-low-vibration platform, enabling 30% higher linewidth repeatability compared to the E3610/E3620. This industry-best performance makes the E3630 ideally suited for measuring the critical dimension (CD) of the miniature-sized patterns on photomasks for EUV (extreme ultraviolet) and nanoimprint lithography. The tool is optimal for photomask development and manufacturing evaluation at the 22nm and 16nm production nodes.