Grenoble-based CEA-Leti and InfiniScale have signed a multi-year joint venture to concentrate on process-variability monitoring in aggressive technologies such as SOI sub-28nm systems.
InfiniScale, a supplier of customized parametrical output analysis and maximization for analog and mixed-signal applications, will supply its Lysis solution for modeling and output optimization of design-kit libraries. The company will also help design a solution to solve process inconsistency issues. The collaboration will utilize Leti’s design and technological know-how to offer InfiniScale access to its fully depleted silicon on insulator (FD SOI) technology to confirm InfiniScale equipment with dimensions on silicon.
Ahmed Jerraya, Leti’s program manager for hardware/software integration says this partnership is a result of Leti’s decision to provide developers access to its FD SOI technology. He also added that collaborating with InfiniScale will enhance its design-equipment with design kit libraries of maximal output circuit blocks.
Firas Mohamed, founder and chief executive officer of InfiniScale says that this partnership allows process variability to become crucial at multi-levels. He also mentioned that the FD SOI technology is crucial for semiconductor companies that evolve constantly.
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