As a testament to Governor Andrew M. Cuomo’s high-tech blueprint for New York State, SUNY Polytechnic Institute’s Colleges of Nanoscale Science and Engineering (SUNY Poly CNSE) announced that it is once again playing a major role at SPIE Advanced Lithography, a leading lithography-focused forum, with forty technical papers by SUNY Poly CNSE faculty, staff, and students and its corporate partners accepted for presentation.
In addition, a SUNY Poly CNSE-based research group has been awarded both best research paper and best research poster at the prestigious conference, held annually in San Jose, California.
“In furtherance of Governor Andrew Cuomo’s vision enabling a high-tech research ecosystem to power New York State’s rapidly expanding innovation economy, SUNY Poly CNSE is thrilled to be recognized at SPIE Advanced Lithography 2015 for its pioneering lithography research,” said SUNY Poly CNSE Executive Vice President of Innovation and Technology and Vice President for Research Dr. Michael Liehr. “In addition to being recognized alongside SUNY Poly CNSE’s corporate partners for the research that has culminated in the presentation of forty scientific papers, this conference also showcases Governor Cuomo’s nanotechnology-based educational paradigm as it provides unmatched student opportunities. A number of SUNY Poly CNSE students have been an integral part of the research that will be presented at the forum, including research into novel photoresists, which was chosen as the conference’s best paper and best poster. This is a perfect example of how an advanced education at world-class facilities, such as those at SUNY Poly CNSE’s $20 billion Albany NanoTech Complex, in collaboration with world-class companies, have made New York State the epicenter for semiconductor-based education, research, development, manufacturing, and commercialization.”
SUNY Poly CNSE-based research papers and posters that are being presented at SPIE Advanced Lithography 2015 cover areas that are critical for addressing current limitations affecting the introduction of advanced lithography for the creation of next-generation computer chips. Lithography is a technique that is used during the computer chip manufacturing process to produce a specific pattern on a silicon disk, called a wafer, in order to build computer chips step-by-step.
The forty research papers that are being presented at SPIE Advanced Lithography 2015 result from the work of leading SUNY Poly CNSE scientists and from researchers who represent a number of SUNY Poly CNSE’s corporate partners, including GLOBALFOUNDRIES, IBM, Samsung Electronics Co., Ltd, and SEMATECH. Topics include, “High-sensitivity molecular organometallic resist for EUV (MORE),” which led to the best paper and poster awards, in addition to topics such as “The Patterning Center of Excellence (CoE): an evolving lithographic enablement model;” “Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry;” and “High-speed e-beam defect inspection: enabling next-generation patterned defect inspection technology for high-volume manufacturing.”
“Highlighting the unique research supporting Governor Andrew Cuomo’s growing nanotechnology-centered economy in New York State, our research group is extremely honored to receive two of the top three awards—best paper and best poster—that are announced at SPIE Advanced Lithography each year,” said SUNY Poly CNSE Professor of Nanoscience Dr. Robert Brainard, EUV Resist Extendability SPIE Advanced Lithography Session Chair and Extreme Ultraviolet (EUV) Lithography VI Program Committee Member. “Our research team consists of SUNY Poly CNSE students and graduates who have investigated novel materials for use in resists, an integral part of the computer chip manufacturing process. This is yet another example of the exciting academic and research opportunities that are available to SUNY Poly CNSE’s top tier students.”
The award for best paper was presented to first author and SUNY Poly CNSE Ph.D. graduate Brian Cardineau and graduate student Ryan Del Re. Presenter and first author James Passarelli, currently a senior at SUNY Poly CNSE, received the award for best poster. The research group earned both awards for research related to the evaluation of nearly 600 new compounds that had never been investigated for use as photoresists, which are used to form a patterned layer on a surface to create the computer chip’s architecture. The research group’s work has led to resists based on tin, cobalt, and antimony, in addition to leading to two patent applications, six publications, one SUNY Poly CNSE student’s Ph.D. thesis, and supporting two bachelor’s degrees, two master’s degrees, and two additional Ph.D.’s.
The 41st annual SPIE Advanced Lithography conference, regarded as the world’s leading nanoelectronics lithography conference and exhibition, is being held February 22 through 26 in California at the San Jose Convention Center and San Jose Marriott.