Nanotechnology News

RSS

SurModics Licensed Lipid Nanoparticle Technology from PharmaSol

SurModics, Inc., a leading provider of surface modification and drug delivery technologies to the healthcare industry, announced today that its Brookwood Pharmaceuticals subsidiary has licensed lipid nanoparticle technol...

15 Jul 2008

Industrial Nanotech Releases Second Addition Nansulate EPX Line

Industrial Nanotech, Inc., an emerging global leader in nanotechnology, today announced that the Company has released a second addition to their patented revolutionary new water-based Nansulate EPX line. EPX-K will offer...

15 Jul 2008

Physicists Reduce Casimir Force by Altering Surface of Plates

University of Florida physicists have found they can reduce the Casimir force by altering the surface of the plates. The discovery could prove useful as tiny “microelectromechanical” systems — so-called MEMS devices that are already used in a wide array of consumer products — become so small they are affected by quantum forces.

15 Jul 2008

New Tools and Processes Designed to Enable Next-Generation MEMS Development

To meet the need for advanced micro-electromechanical systems (MEMS) tools, SVTC Technologies, a leading independent semiconductor process-development foundry, announced that it has expanded its capabilities to enable cu...

15 Jul 2008

Making Ultra-Small Pure Carbon Crystals from Buckyball Molecule

University of Surrey researchers have found a way to make ultra-small pure carbon crystals entirely formed from the spherical carbon 'buckyball' molecule known as C60. The method used involves mixing two liquids ...

15 Jul 2008

IQ Aligner Selected for its UV Nanoimprint Lithography Capability

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that Heptagon Micro-Optics Pte Ltd. in Singapore -- a wholly-owned sub...

15 Jul 2008

Terasem Movement Announced Fourth Annual Workshop on Geoethical Nanotechnology

Terasem Movement, Inc. announced today its Fourth Annual Workshop on Geoethical Nanotechnology will be held Sunday, July 20, 2008 to honor the 39th anniversary of the first human lunar landing. The Workshop, accessible t...

15 Jul 2008

Qualcomm and IMEC to Develop Solutions for 3D Technologies in Future Wireless Products

IMEC, Europe's leading independent nanoelectronics research institute, and Qualcomm Incorporated, a leading developer and innovator of advanced wireless technologies and data solutions, today announced that Qualcomm ...

From IMEC 15 Jul 2008

Oxford Instruments Plasma Technology Launches Latest Customer Support Package

Oxford Instruments Plasma Technology (OIPT), part of Oxford Instruments plc, is pleased to announce the recent launch of its latest customer support package, the 'Pre-Purchased Service Fund' scheme.

15 Jul 2008

Principles Behind Stability and Electronic Properties of Tiny Gold Nanoclusters

A report published in the July 8 issue of the journal Proceedings of the National Academy of Sciences (PNAS) is the first to describe the principles behind the stability and electronic properties of tiny nanoclusters of metallic gold. The study, which confirms the "divide and protect" bonding structure, resulted from the work of researchers at four universities on two continents.

15 Jul 2008

Asylum Research Receives 2008 R+D 100 Award for Breakthrough SPM Technology

Often referred to as the "Oscars of Invention," Oak Ridge National Laboratory (ORNL) and Asylum Research have just received the prestigious 2008 R+D 100 award for the development of Band Excitation (BE), a new breakthrough scanning probe microscopy (SPM) technology.

From Asylum Research - An Oxford Instruments Company 15 Jul 2008

FOA Announces Addition of Newest Device-Maker Members

The Fab Owners Association (FOA), the association of semiconductor / MEMS manufacturing executives and suppliers, has announced the addition of it newest device-maker members: Infineon Technologies ( www.infineon.c...

15 Jul 2008

New Method to Produce Thin Crystalline Silicon Wafers for Solar Cells

IMEC is developing a new method to produce ~50µm thin crystalline silicon wafers for use in solar cells. The process involves mechanically initiating and propagating a crack parallel to the surface of a Si wafer.

15 Jul 2008

Simplified Process to Reduce Cost of Double Patterning

IMEC, in collaboration with JSR Corporation, realized a simplified process using only one etch step to reduce the cost of double patterning. 32nm lines and spaces were printed with a double exposure/single etch process, effectively freezing the resist after the first exposure. This simplified process paves the way for an industrial take-up of double patterning for the 32nm technology node.

15 Jul 2008

32nm SRAM Fabricated Using EUV Technology

IMEC reports functional 0.186µm2 32nm SRAM cells made with FinFETs from which the contact layer was successfully printed using ASML's full field extreme ultraviolet (EUV) Alpha Demo Tool (ADT). Applied Materials, using its most advanced deposition systems, was key to fabricating the ultra-small circuit structures.

15 Jul 2008