Austin, Texas-based Nano-Proprietary, Inc., announced that its subsidiary Applied Nanotech, Inc. will exhibit at "nano tech 2008" in Tokyo, Japan February 13 - 15, 2008. For additional information on this conference visit the conference website at http://www.ics-inc.co.jp/nanotech/en/index.html.
At the conference, ANI will exhibit products and technologies in the areas of:
We will exhibit five different sensor platforms, highlighted by our hydrogen sensor designed for power transformers and our carbon monoxide sensor system prototype designed with the potential to operate for up to 10,000 hours on one battery and developed with the support of the U.S. Air Force and Department of Homeland Security.
We will exhibit our technology for ink-jetting and aerosol-jetting nanocopper inks with electrical conductivity properties similar to that of bulk copper.
Nylon 6 and Nylon 11 nanocomposites (CNTs and nanoclays) with substantially improved mechanical properties will be presented in the resin form for a variety of applications including sporting goods.
Carbon nanotube electron emission
Carbon nanotube electron emission activities will be demonstrated including lighting devices (working in collaboration with Mitsui Corporation), field emission TVs, and a variety of electron sources for different applications. The highlight with respect to the subject will be the presentation of a differential ion mobility sensor (working in conjunction with Sionex Corporation) demonstrating the possibility to replace radioactive sources with electron emission devices using CNTs.
We will present our work with Andes Corporation (supported by the U.S. Army) for destruction of biological contaminants. The highlight will be the PhotoScrub Air Handling Unit and the Biological Elimination Unit. The next phase of development will begin on these units in the near future to integrate them with air handling systems for destruction of biological threats and pathogenic contaminants.
Nano tech 2008 in Tokyo is the largest nanotechnology exhibit and conference in the world and is expected to draw over 50,000 visitors. The exhibition includes approximately 840 booths and 400 firms. This is the sixth consecutive year that Applied Nanotech has exhibited at this important conference.
Applied Nanotech also announced that its patent entitled "Field Emission Device" has been allowed in Japan. This patent was originally issued in the U.S. (U.S. Patent No. 6,064,148) as of May 16, 2000 and has also been issued in China and Korea. This patent is the first of the Company's patents to be issued in Japan, with additional Japanese applications pending. This particular patent covers a simplified process of making a field emission display using carbon films that involves depositing the films on an etched substrate. This process results in an increased yield and lower cost.
"The Japanese market has always been the leader in early adoption of Nano-Technology initiatives," said Tom Bijou, Chairman and CEO of Nano-Proprietary, Inc. "They were the first to join us in funded research activities and will be among the first to bring meaningful products to market embodying Nano-Technology concepts. Having our first patent allowed in Japan is a milestone towards insuring our valuable Intellectual Property is protected worldwide."