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Tokyo Electron Introduces NS300+, New 300mm Scrubber Cleaning Tool

Tokyo Electron Limited (TEL) today announced that the company has begun accepting orders for the NS300+, TEL's new 300mm scrubber cleaning tool. Following the success of the NS300, the new system delivers higher prod...

1 Dec 2008

Report Esxamines Impact of Nanotechnology on Cleantech Markets To 2015

Research and Markets has announced the addition of the "Nanotechnologies for Cleantech" report to their offering. Clean-tech investing is at an all time high and is expected to flourish in a range of sector...

From Research and Markets 1 Dec 2008

Oxford Instruments Plasma Technology Wins Order From a Leading HB-LEDs Manufacturer

Oxford Instruments Plasma Technology (OIPT) is pleased to announce that it has recently won an order from a leading manufacturer of HB-LEDs for three Plasmalab®System133 ICP380 plasma etch tools for use in High Brightness LED (HB-LED) manufacturing.

1 Dec 2008

Novel Lab-on-a-Microfluidic Chip with Very Real Clinical Benefits

If doctors were able to conduct efficient genetic analysis at the point of care, using inexpensive, portable equipment, it would revolutionise disease detection and treatment. European researchers are close to enabling this revolution.

1 Dec 2008

Tokyo Electron Introduces Trias SPAi, a New 300mm Plasma Treatment Reactor

Tokyo Electron (TEL) (TOKYO:8035) today announced that the company will begin receiving orders for the Trias® SPAi beginning January, 2009. The new chamber is a 300mm single-wafer tool for oxidation or nitridation.

1 Dec 2008

Tokyo Electron Introduces Precio octo, New Fully Automated 200mm Wafer Prober

Tokyo Electron, Ltd. (TEL) (TOKYO:8035) today announced the release of Precio octo™, the company's new fully automatic 200mm wafer prober. Precio octo™ offers significant advances in OEE with improved thr...

1 Dec 2008

SiGNa Chemistry Announced Major Expansion of its Central Process Development Laboratory

SiGNa Chemistry, Inc., a developer of stabilized reactive metals for safer, more efficient industrial chemistry, today announced a major expansion of its central process development laboratory in Monmouth Junction, New J...

1 Dec 2008

Applied Materials Unveils Applied Centura Silvia Etch System for TSV Applications

Applied Materials, Inc. today unveiled its Applied Centura® Silvia™ Etch system, specifically designed to enable high-performance, low-cost, through-silicon via (TSV) applications. In addition to delivering a h...

From Applied Materials Inc. 1 Dec 2008

Applied Materials Leads Major Effort to Enable the Widespread Adoption of Through-Silicon Vias

Applied Materials, Inc. today announced that it is leading a major effort to enable the widespread adoption of through-silicon vias (TSVs), a rapidly-emerging approach for vertically stacking integrated circuits (ICs) to...

From Applied Materials Inc. 1 Dec 2008

Harnessing miRNA for Anticancer Therapy

Michel Sadelain and colleagues, at Memorial Sloan-Kettering Cancer Center, New York, have developed a new approach to modulate the expression of genes for therapeutic purposes, and used this to mediate effective anticanc...

1 Dec 2008

Material Indeed a Superconductor - But Only in Two Dimensions

Scientists studying a material that appeared to lose its ability to carry current with no resistance say new measurements reveal that the material is indeed a superconductor - but only in two dimensions. Equally surprising, this new form of 2-D superconductivity emerges at a higher temperature than ordinary 3-D superconductivity in other compositions of the same material.

1 Dec 2008