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Simplified Process to Reduce Cost of Double Patterning

Simplified Process to Reduce Cost of Double Patterning

32nm SRAM Fabricated Using EUV Technology

32nm SRAM Fabricated Using EUV Technology

Research and Markets Announces Addition of Bio-Nanotechnology Report to their Offering

US Supplier of Chromatographic Columns Licenses LBL Technology

US Supplier of Chromatographic Columns Licenses LBL Technology

The Ideal Candidates for the Next Generation of Nanoelectronics

Harnessing the Solar Spectrum using InN-Based Nanostructures

First Nanostructures Ever Measured on Another Planet

First Nanostructures Ever Measured on Another Planet

SiGen’s Innovative Kerf-Free Wafering Equipment Moves into Pilot Line

Three Additional Languages are Available on Nano Risk Framework

Three Additional Languages are Available on Nano Risk Framework

New 266 nm Deep UV Fiber Laser Allows Operator to Define Energy Delivery Strategies

Dyed-Glass Breakthrough Channels Energy into Solar Cells

Dyed-Glass Breakthrough Channels Energy into Solar Cells

Micro-Sized Sewing Machine to Sew Long Threads of DNA into Shape

Micro-Sized Sewing Machine to Sew Long Threads of DNA into Shape

Aviza Technology Receives Order from Advanced Logic IC Manufacturer in Japan

Ultra-Sensitive Nano-Sized Infrared Light Detector

Ultra-Sensitive Nano-Sized Infrared Light Detector

Nanosurf Atomic Force Microscope Has Been Used on Mars by Phoenix Mars Lander

Nanosurf Atomic Force Microscope Has Been Used on Mars by Phoenix Mars Lander

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