Nanotechnology News

RSS

SUSS Expands Next Generation Lithography Mask Integrity Product Portfolio

Today, HamaTech APE GmbH & Co. KG, a wholly owned subsidiary of SÜSS MicroTec AG, introduced the latest addition to its Next Generation Lithography line of mask integrity platforms, the MaskTrack Pro Bake/Develop (BD).

From SUSS MicroTec AG 14 Jul 2010

Increased Customer Acceptance of ASML's Holistic Lithography Solutions

ASML Holding NV (ASML) (NASDAQ:ASML) (Amsterdam:ASML) today at SEMICON West announces broad customer adoption of holistic lithography products which optimize semiconductor scanner performance and provide a faster st...

14 Jul 2010

Piezoelectric-Operated Actuators and Motors Estimated to Reach $12.3 Billion by 2014

A confluence of new piezo-based technology has breathed new capability into the nano- and micro-positioning world. Piezo actuation is increasingly suitable for applications formerly addressable only by magnetic motors, and the technology offers significant benefits in terms of size, speed, fieldlessness, reliability, vacuum compatibility, resolution and dynamics.

13 Jul 2010

Keithley Instruments Announces New Nanotechnology Technical Test Library on CD

Keithley Instruments, Inc. (NYSE:KEI), a world leader in advanced electrical test instruments and systems, announced its new Nanotechnology Technical Test Library on CD.

From Tektronix 13 Jul 2010

Crossing Automation Receives Order for ExpressConnect Integrated Automation Platform

Crossing Automation, Inc., a leading supplier of efficient, cost-effective front-end and back-end automation solutions and engineering services to high volume semiconductor equipment manufacturers, today announced that it has received an order for its ExpressConnectTM integrated automation platform.

13 Jul 2010

INSCX Provides World's Only Source of Accredited Engineered Nanomaterials Available on Any Exchange

The Integrated Nano-Science + Commodity Exchange (INSCX exchange) operates to provide the world’s only source of accredited, compliant and validated engineered nanomaterials available on any exchange. INSCX will tr...

13 Jul 2010

Bayer Technology Services Collaborates with University of Erlangen-Nürnberg

Bayer Technology Services GmbH (BTS) and the Excellence Cluster for the Engineering of Advanced Materials – Hierarchical Structure Formation for Functional Devices (EAM) at the University of Erlangen-Nürnberg ...

13 Jul 2010

Imec Demonstrates Value of SiGe above-IC MEMS Technology Platform

Imec demonstrates the value of its SiGe above-IC MEMS technology platform for improving performance of state-of-the-art MEMS with the development of new MEMS devices. The new devices are a 15µm SiGe micromirror and a grating light valve for high-resolution displays.

From IMEC 13 Jul 2010

Imec and ASML Qualifies ASML's Tachyon and FlexRay

Imec and ASML collaborated to qualify ASML’s Tachyon Source Mask Optimization and programmable illuminator system FlexRay™, proving its potential with the demonstration of a 22nm SRAM memory cell.

From IMEC 13 Jul 2010

Imec Sets Major Step Towards 20nm Half Pitch Interconnects

Imec sets major step towards 20nm half pitch interconnects with the realization of electrically functional copper lines embedded into silicon oxide using a spacer-defined double patterning approach.

From IMEC 13 Jul 2010

Imec Large-Area Epitaxial Solar Cell with Efficiency of 16.3% on High-Quality Substrate

Imec realized large-area (70cm2) epitaxial solar cells with efficiencies of up to 16.3% on high-quality substrates. And efficiencies of up to 14.7% were achieved on large-area low-quality substrates, showing the potential of thin-film epitaxial solar cells for industrial manufacturing.

From IMEC 13 Jul 2010