Semilab’s inSE-1000 is the new in situ Spectroscopic Ellipsometer on the market. This tool offers fast access to optical properties and layer thicknesses through ellipsometric spectra analysis during etch processes or layer deposition in vacuum chambers like the ALD chamber. It can be also placed on the load lock, cooling and transfer chamber for post-process analysis, without any interruption to the vacuum.
Part of Semilab’s ellipsometry range of tools, the inSE-1000 has been engineered mainly for measurement on vacuum chambers during treatment or deposition processes carried out in load locks.
The ellipsometer’s arms can be effortlessly mounted and located on the vacuum chamber or an offline test bench for a complete analysis of the end product. The additional systems and electronic components are kept in a cabinet, which can be placed close to the deposition tool. On-demand measurement sequences with the two-way communication protocol and the deposition tool are facilitated by the Ethernet interface.
Key Features and System Specifications of the inSE-1000
- Beam divergence < 0.2° (no focusing, in parallel beam)
- Compact arms
- Optical fiber supplies 75 W, short arc Xenon lamp
- Rotating compensator optics
- CF-40 vacuum port interface
- Spectral resolution for quick mode
- Each layer is modeled with proven methods such as phase node model, anisotropic layer evaluation, alloy model, periodic layers, user-specified free formula, or dispersion laws
- Ethernet-based communication protocol with the deposition tool computer
- The biggest (k, n) database
- Direct visualization of the measurement data and the fitting results — thickness and optical properties
InSE-1000 on Picosun ALD.
InSE-1000 on ALD.
Ex situ bench.