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Joint Effort by Longtime Partners to Develop Resists for EUVL Processing

Tokyo Electron Limited (TEL) and SEMATECH today announced that TEL has joined SEMATECH's Lithography Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany. The TEL team wi...

23 Feb 2010

University Chooses NanoSight Characterization System to Aid in Drug Delivery Research Programs

The Division of Drug Delivery Technology is part of the Leiden/Amsterdam Center for Drug Research (LACDR), a research institute located at the Gorlaeus laboratories in Leiden in the Netherlands.

23 Feb 2010

Kavli Foundation Establishes Kavli Prize Science Forum

The Norwegian Academy of Science and Letters, in partnership with The Kavli Foundation and the Norwegian Ministry of Education and Research, has announced the establishment of the Kavli Prize Science Forum – a new bienni...

23 Feb 2010

Dialog Semiconductor Partners with TSMC to Develop BCD Technology for Power Management ICs

Dialog Semiconductor plc (FWB: DLG), a leading provider of highly integrated innovative power management semiconductor solutions, today announced that the company is working closely with foundry partner Taiwan Semiconduc...

From TSMC Taiwan Semiconductor Manufacturing Company 23 Feb 2010

Natcore Enters Deal to Develop Film-Growth Equipment for Solar Cell Using LPD Technology

Natcore Technology Inc. (TSX-V: NXT; OTC Pink Sheets: NTCXF) today announced that it has reached agreement with a consortium in China to form a joint venture company to develop and manufacture film-growth equipment and m...

23 Feb 2010

Applied Materials to Host Seminar on Cost-Effective Lithography Technologies

Current optical lithography techniques for patterning semiconductor devices are rapidly reaching their limits. While immersion lithography with double patterning appears to be extendible to 19nm for flash memory devices and potentially to 15nm logic designs, EUV lithography is viewed as the most likely successor.

From Applied Materials Inc. 23 Feb 2010

Olympus Unveils New Microscope Systems That Offer Advanced Fluorescent Imaging Techniques

Olympus has introduced a new, highly versatile, range of cutting-edge research microscope systems. The Olympus xcellence line covers advanced live cell techniques such as real-time high-speed imaging, TIRFM & HILO (c...

23 Feb 2010

Registration for San Jose Printed Electronics Summit Commenced

With the printed electronics industry poised to explode into the mainstream market, representatives from Europe, Asia and America have already started registering for the Printed Electronics summit, taking place May 10-1...

23 Feb 2010

Rite Track Becomes Exclusive Distributor for Expertech Diffusion Furnace Products in Asia

Rite Track, Inc., a leading semiconductor equipment supplier based in West Chester, Ohio announced today that it has signed an agreement to act as the sole distributor for Expertech diffusion furnace products, parts and services in Asia.

23 Feb 2010

Tronics and Si-Ware Systems Announces Partnership Agreement

Tronics, a leading global, manufacturer of integrated custom MEMS components, and Si-Ware Systems, an analog and mixed-signal ASIC solutions provider, today announced their partnership agreement for the development and c...

23 Feb 2010

New Dispersion Technology Enables Full Utilization of Electrical and Thermal Conductivity of Carbon Nanotubes

Aqueous suspensions of carbon nanotubes (CNTs) containing individual tubes offer interesting perspectives for a number of new applications which depend on a high electrical or thermal conductivity, respectively. In particular, this applies to multifilament yarns coated with such CNT dispersions.

From Covestro AG 23 Feb 2010

Samsung Becomes Xilinx's Foundry Partner for 28nm HKMG Process Technology

Samsung Electronics Co., Ltd., a global leader in advanced semiconductor technology, announced today that it has been selected by Xilinx as its foundry partner for 28nm high-k metal gate (HKMG) process technology manufac...

23 Feb 2010

Xilinx Optimizes 28nm Technology Node by Selecting Low-Power Process Technology

Xilinx Inc. (Nasdaq: XLNX) today announced the foundation for a next-generation of Xilinx programmable platforms that will give system designers FPGAs that consume half the power at twice the capacity than previously possible for addressing the Programmable Imperative.

23 Feb 2010

API Technologies Closes its New Jersey-Based Nanotechnology Research Unit

API Technologies Corp. (OTC Bulletin Board: ATNY) ("API" or the "Company"), a prime contractor in sophisticated electronics, highly engineered systems, secure communications and electronic components ...

23 Feb 2010

Researchers Develop Sound Emitting Practical Phonon Lasers

Physicists have taken major step forward in the development of practical phonon lasers, which emit sound in much the same way that optical lasers emit light. The development should lead to new, high-resolution imaging...

23 Feb 2010