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CVD Equipment Receives More Orders for Nanotechnology Devices

CVD Equipment Receives More Orders for Nanotechnology Devices

Berkeley Design Automation Signs Contract with EDA Distributors for Nanometer Circuit Verification

Berkeley Design Automation Signs Contract with EDA Distributors for Nanometer Circuit Verification

Gigaphoton Affirms Debris Mitigating Technology of LPP Light Sources for EUV Lithography

Gigaphoton Affirms Debris Mitigating Technology of LPP Light Sources for EUV Lithography

Chemists to Study Interactions between Carbon Nanotubes and Photoluminescent Materials

Chemists to Study Interactions between Carbon Nanotubes and Photoluminescent Materials

Snowbush Enhances Multi-Standard PHY IP Platform to Solve Design Issues at 28nm

Snowbush Enhances Multi-Standard PHY IP Platform to Solve Design Issues at 28nm

SUSS MicroTec Launch First Holistic In-Fab EUVL Mask Management System

Cientifica Release 2011 Report Global Nanotechnology Funding and Impact

Cientifica Release 2011 Report Global Nanotechnology Funding and Impact

Overview of Global Thin Film Solar Photovoltaic Production

Overview of Global Thin Film Solar Photovoltaic Production

Synopsys Joins Hands with GLOBALFOUNDRIES for 65nm Process Technologies

Mattson Technology Releases paradigmE Si for Silicon Etch Applications

Mattson Technology Releases paradigmE Si for Silicon Etch Applications

SACHEM and Avantor to Develop Selective Etch Solutions for Semiconductor Industries

SACHEM and Avantor to Develop Selective Etch Solutions for Semiconductor Industries

Advanced Micro-Fabrication Equipment’s Etch Tool for Critical Process Challenges at 22 nm and Beyond

Advanced Micro-Fabrication Equipment’s Etch Tool for Critical Process Challenges at 22 nm and Beyond

SiTime Launches MEMS VCTCXO Products to Support High Frequencies

SiTime Launches MEMS VCTCXO Products to Support High Frequencies

Synopsys Collaborates With Samsung to Rollout 20 nm Test Chip

Synopsys Collaborates With Samsung to Rollout 20 nm Test Chip

Entegris and CEA-Leti to Address Molecular Contamination Problems Between Semiconductor Wafers and Containers

Entegris and CEA-Leti to Address Molecular Contamination Problems Between Semiconductor Wafers and Containers

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