Today SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, launched its new MaskTrack Pro InSync - the first holistic in-fab EUVL mask management offerin...
Cientifica, the worlds most respected nanotechnology information and forecasting company has just released the much anticipated 2011 report on global nanotechnology funding and impact.
Report Linker has added a new report, Thin Film Solar PV Manufacturing Equipment Worldwide, to its offerings.
By Dr. Cameron Chai
13 Jul 2011
Synopsys, a company that supplies intellectual property and software for semiconductor design, production, and validation, declared that it has joined hands with GLOBALFOUNDRIES to design, support, test, and distribute i...
By Dr. Cameron Chai
13 Jul 2011
Mattson Technology has released the paradigmE Si into the market, which is useful for semi-crucial silicon etch applications.
By Dr. Cameron Chai
13 Jul 2011
Avantor Performance Materials have signed a joint development agreement (JDA) with SACHEM to deliver customized, next-generation selective etch chemical solutions to be suitable for semiconductor manufacturing.
By Dr. Cameron Chai
13 Jul 2011
Advanced Micro-Fabrication Equipment is unveiling its second-generation 300 mm ultra-high frequency advanced decoupled reactive ion etch (AD-RIE) system called the Primo AD-RIE tool, which is ideal for major process challenges at 22 nm and below at SEMICON West.
By Dr. Cameron Chai
13 Jul 2011
SiTime, a company that manufactures analog semiconductors, has launched high-stable, MEMS voltage controlled, temperature compensated oscillator (VCTCXO) devices.
By Dr. Cameron Chai
13 Jul 2011
Synopsys, a company that provides IP and software to design and manufacture semiconductors, declared that its design enablement partnership with Samsung Electronics has resulted in the successful release of the 20 nm test chip implemented using the High-k metal gate (HKMG) process technology from Samsung.
By Dr. Cameron Chai
13 Jul 2011
Entegris and CEA-Leti have signed a two-year contract to observe cross-molecular contamination that occurs between semiconductor containers and wafers.
The University of California, Riverside physicists have found a new approach to generate positronium, an atom with a short lifespan, to help solve queries related to antimatter in the universe such as why nature preferred matter over antimatter when the universe was created.
By Dr. Cameron Chai
13 Jul 2011
Cadence Design Systems, a company that delivers electronic design solutions, declared that Samsung Electronics has introduced the Cadence unified digital flow for producing a test chip at 20 nm.
By Dr. Cameron Chai
13 Jul 2011
SUSS MicroTec will collaborate with Tanaka Kikinzoku Kogyo to develop bonding technology and pattern transfer with the help of gold particles of sub-micron dimensions.
By Dr. Cameron Chai
13 Jul 2011
EU’s Seventh Framework Programme provides financial assistance to conduct a research project that aims to test all available combinations of organic and inorganic materials to deliver energy-efficient photovoltaic batteries and solar panels.
By Dr. Cameron Chai
13 Jul 2011
Synopsys has introduced the IC Compiler-Advanced Geometry, a new version of its IC compiler, to provide design support for double-patterning technology (DPT), which serves as a pre-requisite for advanced silicon technology at 20 nm and imposes stringent restrictions on routing, placement and physical validation.
By Dr. Cameron Chai
13 Jul 2011