Sputtering Manufacturing Process from SemicoreEquipment

This video shows SemicoreEquipment's sputtering manufacturing process. This process starts when a substrate to be coated is placed in a vacuum chamber containing an inert gas. The negative charge is applied to a target source material that will be deposited onto the substrate causing the plasma to glow. The number of atoms ejected or “Sputtered off” from the target or source material is called the sputter yield.

Run Time: 2:24min

What Is PVD Sputtering?

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