Posted in | Nanomaterials

The Beneq TFS 200 Thin Film System for Atomic Layer Deposition (ALD)

The Beneq TFS 200 Thin Film System for atomic layer deposition (ALD) is the most flexible and upgradable ALD system on the market. Some of its features include:

  • Up to 3 liquid sources
  • 8 gas lines
  • Hot sources
  • Thermal reaction chamber with load lock

Run time - 3:45min

Beneq TFS 200 Atomic Layer Deposition

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