Nanoimprint Lithography Equipment RSS Feed - Nanoimprint Lithography Equipment

Nanoimprint Lithography or NIL is a process used to fabricate nanoscale patterns typically used in the areas of electronics, optics, photonics or biology. It creates patterns by mechanically deforming an imprint resist that is typically made from a monomer or polymer and cured using UV light. The nanoimprint lithograpy process is characterized by low cost, high throughput and high resolution and is a much simpler process than its rival optical lithography.
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Equipment
The EVG® 720 system includes a next-generation UV nanoimprint lithography (UV-NIL) technology to allow large-scale production of micro- and nanoscale structures.
The EVG PHABLE exposure system integrates an exclusive, contactless, mask-based lithography approach that allows high-resolution, full-field, and cost-efficient micro- and nanopatterning. The system leverages EVG's extensive expertise in photolithography and has been specifically designed for producing photonic components.
Built on EVG's extensive expertise in batch-type hot embossing, the EVG750® R2R hot embossing system allows continuous moulding with considerable benefits in terms of operational speed and device throughput.
The IQ Aligner UV-NIL System allows for micromolding and nanoimprinting processes with stamps and wafers from 150 mm to 300mm diameter. Uniform contact force for high yield large area printing is provided by EV Group's proprietary chuck design which supports both soft and hard stamps. Configurations include release mechanisms for stamps from imprinted substrates.
The EVG520HE Semi-automated Hot Embossing System is designed for embossing and nanoimprinting applications. This production-proven system from EVG accepts substrates up to 200 mm and is compatible with standard semiconductor manufacturing technologies.
The EVG6200 Infinity automated nanoimprint lithography system is the culmination of EV Group's new aligner-technology roadmap. A variety of stamps and substrates sizes from 75mm-to-200mm can be accommodated on the EVG6200 Infinity for nanoimprint lithography applications.
EV Group's EVG770 Automated NIL Stepper is designed for step and repeat large area UV-Nanoimprint Lithography (UV-NIL) processes compatible for 100 mm up to 300 mm wafers. The NIL Stepper covers applications like life science, optical components, mastering, 3D-Lithography and R&D for semiconductor devices.