Plasma Etching Systems

Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged or neutral.

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Equipment

Plasma Etcher-Asher-Cleaner - The K1050X from Quorum Technologies

The K1050X Plasma Etcher/Asher/Cleaner is a modern, solid-state RF plasma barrel reactor designed to meet the requirements of research and development and small-scale production for a wide and varied range of plasma etching, plasma ashing and plasma cleaning applications.

AutoGlow Plasma Cleaning System from Ted Pella

The AutoGlow Plasma Cleaning System is an automatic tuning, 300 watt, table-top RF plasma system that provides an extremely efficient, uniform plasma for lab applications. It has been designed with the latest developments in RF technology to allow users a safe and rugged RF plasma system at a reasonable price.

Plasma Etching-Cleaning System - TETRA-30-LF-PC from Diener Electronic

The small scale system TETRA-30-LF-PC fromDiener Electronic features a 30 litre chamber volume and is used for production in the domains: cleaning, etching and activation.