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Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged or neutral.
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Equipment
Oxford Instruments’ PlasmaPro Estrelas100 deep silicon etch technology has been specifically developed for the R&D market and delivers excellent process performance and flexibility.
Oxford Instruments’ Ionfab 300Plus ion beam etch and deposition system provides the flexibility to operate etch and/or deposition and increases system utilisation.
The AutoGlow Plasma Cleaning System is an automatic tuning, 300 watt, table-top RF plasma system that provides an extremely efficient, uniform plasma for lab applications. It has been designed with the latest developments in RF technology to allow users a safe and rugged RF plasma system at a reasonable price.
The Oxford Instruments Plasma Technology OpAL system is a compact open-load system designed for Atomic Layer Deposition (ALD).
For over 15 years, Oxford Instruments Plasma Technology has been a leading supplier of high-volume batch plasma tools in the production market with a wide installed base of HBLED production solutions in operation.
Oxford Instruments’ FlexAL systems offer a new range of capability and flexibility in the fabrication of nanoscale structures and devices by providing remote plasma atomic layer deposition (ALD) processes and thermal ALD inside a single ALD system.
The K1050X Plasma Etcher/Asher/Cleaner is a modern, solid-state RF plasma barrel reactor designed to meet the requirements of research and development and small-scale production for a wide and varied range of plasma etching, plasma ashing and plasma cleaning applications.
The small scale system TETRA-30-LF-PC fromDiener Electronic features a 30 litre chamber volume and is used for production in the domains: cleaning, etching and activation.
Oxford Instruments’ PlasmaPro 100 Sapphire is an evolution in single wafer etch technology.
Oxford Instruments Plasma Technology has introduced an evolutionary Batch Etch technology with the PlasmaPro1000 Astrea large batch etch system.
The PlasmaPro System400, from Oxford Instruments Plasma Technology, is a magnetron sputtering process tool for Physical Vapour Deposition (PVD).